Focused Ion Beam.

Key Features.

• Highest-quality, site-specific, sample preparation for TEM and APT using the new high throughput Tomahawk HT Ion Column

• The most complete sample information with sharp, refined and charge-free contrast obtained from up to six integrated in-column and below-the-lens detectors

• The highest-quality, multi-modal subsurface and 3D information with the most precise targeting of the region of interest using optional Auto Slice & View 4 (AS&V4) Software

• Fast, accurate and precise milling and deposition of complex structures with critical dimensions of less than 10 nm

• Easiest sample handling and navigation with high flexibility 110 mm stage, multi-purpose sample holder and Nav-Cam+

• Artifact-free imaging based on integrated sample cleanliness management and dedicated imaging modes such as DCFI and SmartScan Modes

Electron optics:

• Elstar ultra-high-resolution field emission SEM column

• Resolution: ≤ 0.6 nm @ 15 kV；≤ 1.0 nm @ 1 kV

• Electron beam current range: 0.8 pA to 176 nA

• Accelerating voltage range: 200 V – 30 kV

Ion optics:

• Ion source: Ga

• Resolution: ≤ 4.0 nm @ 30 kV，≤ 2.5 nm @ 30 kV

• Ion beam current range: 1 pA – 100 nA

• Accelerating voltage range: 500 V – 30 kV

GIS system:

• Pt / W

Detectors:

• SE / BSE

• EDS: Oxford UltimMax65

• STEM

EasyLift NanoManipulator